Atomic Layer Deposition of Optical Coatings

Emmy Noether junior research group – Adriana Szeghalmi

Atomic layer deposition (ALD) is a powerful coating technology with excellent thickness control, uniformity, and conformal film deposition on high aspect ratio nanostructures. Dielectric and metallic functional coatings deposited by (ALD) are essential in the development of improved and innovative diffractive optics. Additionally, highly curved surfaces such as lenses and cylinders are efficiently functionalized by ALD. The Emmy Noether junior research group „Atomic Layer Deposition of Optical Coatings“ deals with the development and characterization of thin film coatings for optical applications, the nucleation and film growth of thin films and the development of novel ALD processes.


Friedrich Schiller University Jena
Institute of Applied Physics
Dr. Adriana Szeghalmi
Albert-Einstein-Straße 15
07745 Jena

Phone: +49 3641 9-47859